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Low Boron & Low Organic Compounds Air Filter

LB: Low Boron
LO: Low Organic Compounds
LL: Low Boron & Low Organic Compounds

In the road map of the semiconductor technology, where the design rule of the device becomes the area of 0.13 um or less, a molecular pollution measures in addition to past particle pollution measure are needed.

Taiwan Nitta builds a molecular pollution measures in preparation for the request in the age, and it is high, and low boron and low organic compounds Filter are commercialized and has already built a lot of delivery results of reliability in a Japanese market by accumulation the material technology and the molecular pollution evaluation technology.

It is insufficient in next generation`s clean room though the Shiroki San pollution measures, the DOP pollution abatement, and the organic phosphorus pollution measures have already been completed in past standard goods on a molecular pollution measures.

A molecular pollution measures form Filter assumed for a lot of material surface areas to exist in the material used for a clean room are problems of the pressing need for next generation`s clean room. The LB-LO product is a product which reduces the pollution generation from the material to the utmost limit.

Especially, the boron polluted by measure of the high boiling point organism which influences the process of the semiconductor and the air introduction, ammonia, and an acid gas measures can be completely controlled by combining the LB-LO product and the chemical filter.


Panel Type
Standard HEPA Filter

Model
Depth
(mm)
Face Velocity
Pressure
Drop(Pa)
Efficiency
(at 0.3µm)
Safety Standards
UL900
FM4920
LB3502
52
0.5
120
99.99%
---
O
0.85
210
99.97%
LB3402
68
0.5
95
99.99%
---
O
0.85
165
99.97%
LB3802
86
0.5
80
99.99%
---
O
0.85
140
99.97%
LL3502 52 0.5
125
99.97%
---
---
LL3402 68 0.5
100
99.99%
---
---
LO3501 52 0.5
140
99.99%
---
---
0.85
250
LO3401 68 0.5
110
99.99%
---
---
0.85
200
LO3801 86 0.5
90
99.99%
---
---
0.85
160
LL3501 52 0.5
140
99.99%
---
O
0.85
250
LL3401 68 0.5
110
99.99%
---
O
0.85
200
LL3801 86 0.5
90
99.99%
---
O
0.85
160
*UL900 & FM4920 product is optional.

Panel Type
Standard ULPA Filter
Model
Depth
(mm)
Face Velocity
Pressure
Drop(Pa)
Efficiency
(at 0.3µm)
Safety Standards
UL900
FM4920
LB3542
52
0.5
170
99.999%
---
O
LB3442
68
0.5
135
99.999%
---
O
LB3842
86
0.5
110
99.999%
---
O
0.85
190
LO3541 52 0.5
200
99.999%(5N)
CLASS 2
O
LO3441 68 0.5
145
99.9995%(5N5)
CLASS 2
O
0.85
250
99.999%(5N)
LO3841 86 0.5
125
99.9995%(5N5)
CLASS 2
O
0.85
215
99.999%(5N)
LL3541 52 0.5
200
99.999%(5N)
CLASS 2
O
LL3441 68 0.5
145
99.9995%(5N5)
CLASS 2
O
0.85
250
99.999%(5N)
LL3841 86 0.5
125
99.9995%(5N5)
CLASS 2
O
0.85
215
99.999%(5N)
*UL900 & FM4920 product is optional.


2.Boron Emission Test Results


3. Project
Decreasing organic outgas from air filter .

Decreasing organic out-gas from materials.

Evaluation: Measurement of organic deposition on wafer

Target value <1ng/cm2
(Requirement by customers)


4. Outgas Test of Materials
Test Equipment and Conditions

Equipment
TCT (Termal desorption Cold Trap Injector)
Model CP-4020 GL-Science
Auto-Sampler
Model TMD-253H GL-Science
GC-MS
Model MD-800 Thermo-quest

Conditions
TCT
Desorption Temp.80~150°C, 10min
Injector Temp.250°C
Cold trap Temp.-130°C
GC-MS
Culumn TC-1 0.25µm, 60mx0.25mm
Temp.40°C, 5min---10°C/min, 280°C, 21min
Equivalent to Toluene

5. Outgas Test Results
Organic Outgas from Materials Decreased.

6.Wafer Test for Filter Evaluation
(Organic deposition on wafer)
Test Equipment and Condition

Wafer Silicon 8inch Equipment
Wafer Thermal Description - GC
- Mass (WTD-GC-MS)
In He Gas Temp.400°C


7. Wafer Test Results

TAIWAN NITTA FILTER CO., LTD.
Head office : Chia Hsin Building 10 Fl., Room No. 1005, 96 Chung Shan N. Rd., Sec. 2, Taipei, Taiwan, R. O. C.
TEL :+886-2-2581-6296 FAX :+886-2-2563-4900
Factory : 2-1, Industrial 2nd Rd, Pinchen Industrial Park, Taoyuan. Taiwan. R.O.C.
TEL :+886-3-469-7551 FAX :+886-3-469-0260
http://www.nitta.com.tw